Surface bacteria and germs are a major health concern today
To defend against them, BIOSWEEP® offers two (2) highly effective solutions – BIOSWEEP Base Treatment and BIOSWEEP Surface Defense!
Using a unique and powerful, industry leading technology developed exclusively by Phocatox Technologies, BIOSWEEP Base Treatment totally eradicates airborne and surface organic molecules and microorganisms, including a wide range of pathogens and bacteria.
For long-lasting protection, BIOSWEEP also offers BIOSWEEP Surface Defense, a specially formulated and durable antimicrobial application that binds to virtually ANY type of surface killing and reducing disease-causing bacteria, viruses, germs, mold, and odors on contact.
While it can be used alone, it is recommended to use BIOSWEEP Surface Defense as a long-lasting antimicrobial “shield” after BIOSWEEP Base Treatment air and surface germ elimination.
BIOSWEEP Surface Defense provides durable surface protection that will continue to disinfect 24 hours a day / 7 days a week – for up to 6 months!
The BIOSWEEP™ process employs proven technology called photocatalytic oxidation (PCO) in a five-stage process to produce simultaneous, interrelated forms of oxidation to eradicate airborne organic contaminants. These vapour compounds are unsurpassed in field applications for their penetrating oxidative power to remove virtually any embedded or persistent odour.
BIOSWEEP MULTIPHASE PROCESS
Air comes into the bottom rear of the BIOSWEEP™ unit. High intensity germicidal irradiation is lethal to incoming airborne microorganisms, creating peptide bonds within their DNA, preventing them from further replication. All other slices of the UV Band are used as well.
A dense cloud of powerful molecular oxidizers attack bio-particles and rapidly begin breaking the carbon bonds that form their cellular matter. Approximately 70% of the systems energy goes into creating this powerful sterilizing plasma gas, which includes singlet oxygen, superoxide, hydrogen peroxide and three oxyradicals: hydroxyl radicals, the atomic oxygen radical, and hydro peroxide radicals. These agents remain in the chamber.
Purified trivalent oxygen, called ozone, is produced which contributes to oxidization within the chamber and production of more oxyradicals. Bulk ozone and hydrogen peroxide molecules leave the top of the unit to continue their work outside the chamber for another 30-45 minutes before decaying harmlessly back to the natural elements from which they were made.
Special nanoparticles coated on the entire inner chamber wall undergo a photocatalytic reaction driven by the UV energy field. They convert water vapour in the air or feed gas into more hydroxyl radicals projecting from the entire inner surface. The new oxyradicals break up passing organic matter and generate more oxyradicals from the O3 concentration present.